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https://en.wikipedia.org/wiki/Photolithography
Photolithography, also called optical lithography or UV lithography, is a process used in microfabrication to pattern parts on a thin film or the bulk of a substrate (also called a wafer).It uses light to transfer a geometric pattern from a photomask (also called an optical mask) to a photosensitive (that is, light-sensitive) chemical photoresist on the substrate.Estimated Reading Time: 11 mins
https://users.wfu.edu/ucerkb/Nan242/L15-Photolithography.pdf
was a printing method using ink, metal plates and paper. • In modern semiconductor manufacturing, photolithography uses optical radiation to image the mask on a silicon wafer using photoresist layers. • Other methods are electron beam, scanning probe, X-ray and XUV lithography.
https://www.sciencedirect.com/topics/materials-science/optical-lithography
Patrick Naulleau, in Comprehensive Nanoscience and Nanotechnology (Second Edition), 2019. Abstract. Optical lithography is a photon-based technique comprised of projecting an image into a photosensitive emulsion (photoresist) coated onto a substrate such as a silicon wafer. It is the most widely used lithography process in the high volume manufacturing of nano-electronics by the semiconductor ...
https://pubmed.ncbi.nlm.nih.gov/16730059/
A photolithographic method to create cellular micropatterns Biomaterials. 2006 Sep;27(27):4755-64. doi: 10.1016/j.biomaterials.2006.04.028. Epub 2006 May 26. Authors Jeffrey M Karp 1 ...
https://www.student-circuit.com/learning/year3/vlsi-design/what-is-photolithography-process/
Apr 20, 2018 · The photomask is called a reticle. The stepper moves the reticle across the wafer. The most recent method that is used in photolythography process is projector printing. The pitch of the printed mask is 2 b = λ n sin α k 1, where λ is the UV light source wavelength, n is the refractive index of the medium, and α is the acceptance angle of ...
https://patents.google.com/patent/US20020192575A1/en
US20020192575A1 US10/188,146 US18814602A US2002192575A1 US 20020192575 A1 US20020192575 A1 US 20020192575A1 US 18814602 A US18814602 A US 18814602A US 2002192575 A1 US2002192575 A1 US 2002192575A1 Authority US United States Prior art keywords reticle recited resolution sub printable Prior art date 1999-08-19 Legal status (The legal status is an …Cited by: 84
https://nanoscale.unl.edu/pdf/Photolithography_Participant_Guide.pdf
mask or reticle (depending on the method of exposure) to a photosensitive layer (resist). In the construction of microsystem devices a subsequent process step, usually etch or liftoff, transfers the pattern from the photosensitive layer into an underlying layer. After the pattern transfer, the resist is usually stripped or removed.
http://imicromaterials.com/technical/lithography-process-overview
Following is a step by step overview of the basic lithography process from substrate preparation through developing of the photoresist image. It should be noted that the addition of anti-reflective coatings, lift-off layers, image reversal steps, etc. can add significant levels of …
https://whatis.techtarget.com/definition/photolithography
Photolithography is the standard method of printed circuit board (PCB) and microprocessor fabrication. The process uses light to make the conductive paths of a PCB layer and the paths and electronic components in the silicon wafer of microprocessors.. The photolithography process involves light exposure through a mask to project the image of a circuit, much like a negative image in standard ...
https://www.sciencedirect.com/topics/physics-and-astronomy/photolithography
Photolithography is widely used in the semiconductor industry and large-scale mass production of Si-based devices down to several tens of nanometers. Also in functional oxides, it has been applied to the preparation of prototype devices: for example, magnetic oxide tunneling junctions, field effect transistors, and so on [58–60].Currently this technique is indispensable for oxide electronic ...
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